Industry
Semiconductor & Solar
Ultra-high purity tube systems for semiconductor fabrication, solar wafer production and high-purity gas distribution — Ra ≤ 0.25 µm, particle-count validated to Class 1, AMS 2700 and SEMI F20 compliant.
Overview
Contamination control at every node.
Semiconductor and solar process lines demand surfaces where particle generation and metallic contamination are measured in parts-per-trillion. rensa Max UHP tubes are electropolished to Ra ≤ 0.25 µm, Cr/Fe oxide ratio > 2.0 verified by XPS, particle-count validated and nitrogen-purged before double-bag packaging.
- UHP-EP Ra ≤ 0.25 µm (ID)
- Cr/Fe oxide ratio > 2.0 (XPS)
- Particle class 1 (≥ 0.2 µm)
- AMS 2700 & SEMI F20
- 316L-CS low-sulphur grade
- N₂-purged, double-bagged
- VCR / VCO compatible ends
- Full UHP data pack
Standards
Applicable Standards
Global
Passivation of corrosion-resistant steels — defines Cr/Fe ratio and surface chemistry requirements.
SEMI
Specification for the surface chemistry of stainless-steel components used in semiconductor gas distribution.
SEMI
Specification for the surface roughness of electropolished stainless-steel components.
Global
Sanitary tubing standard supporting UHP-grade seamless and welded 316L-CS tubing.
Applications
Where We Are Used
Process Gas Distribution
Silane, HCl, NH₃, HF and specialty gas lines in semiconductor fabs.
Chemical Delivery (CDS)
Ultra-pure chemical distribution for wet etch, CMP and cleaning processes.
Solar Wafer Production
HF and corrosive chemical lines for silicon wafer texturing and cleaning.
Hydrogen Energy Systems
High-purity hydrogen distribution for fuel cells and electrolysers.
Display / OLED Panels
Specialty gas and chemical delivery for flat panel and OLED display lines.
R&D Cleanrooms
Research-grade UHP tubing for university and government research facilities.
Request a UHP qualification package
Ra, Cr/Fe, particle count records and samples aligned to your fab qualification requirements.